The effluent (off gas) of a CVD reactor typically consists of chlorosilanes (STC, TCS, and DCS), H2, HCl, and trace impurities. The OGR system separates the main components and removes impurities. The H2, TCS, and DCS are recycled to the CVDs while the STC and HCl are returned to the hydrochlorination area. Impurities are removed from the process and neutralized. Our Off Gas Recovery (OGR) system is customized for operation with modern CVD reactors recovering the process gases exiting the CVD reactors. This customized solution has reduced CAPEX and OPEX relative to traditional OGR designs currently employed by most polysilicon producers.
The OGR system can be implemented as a revamp to existing facilities to reduce overall production cost of polysilicon.